Using electron beams to create the patterns directly on a chip. The wavelength of an electron beam is only a few picometers compared to the extreme ultraviolet (EUV) light used in state-of-the-art ...

Until EUV lithography becomes a reality, multiple patterning technologies such as triple litho-etch (LELELE), self-aligned double patterning (SADP), and self-aligned quadruple patterning (SAQP) are ...